The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水化硅具有微米亚微米纳米三次结
。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水化硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽化是以高纯水蒸汽为
化
,
硅片表面的硅原子和水分子反应生成
化硅。
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